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SEQUOIA Cell Designer is now available worldwide for advanced lithography simulation and DFM.

SEQUOIA's Valery Axelrad presented an invited paper entitled "Design and Simulation of ESD-Resistant ICs" at this year's MIXDES conference in Gdynia, Poland.

New publications here

SCR-based ESD protection

Grounded-Gate MOSFET ESD Protection

Cascoded NMOS Output Buffer Design

Physical Simulation of CDM ESD Events

SEQUOIA Device Designer: Complete integrated TCAD system for physical-level circuit simulation. Includes framework for schematic capture, mixed - mode simulation, semiconductor device design and optimization, device structure synthesis, mesh generation, visualization and parameter extraction. Advanced physical models cover all critical effects in modern semiconductor devices. Outstanding simulation performance far ahead of similar products widely used in the industry. Efficient utilization of multi-core processor architectures.

SEQUOIA Cell Designer: advanced lithography simulation and DFM. In-depth accurate simulation of advanced photo-lithography effects including those required for 193nm immersion lithography. Simulation accuracy extensively validated by our customers and development partners including a major lithography equipment manufacturer. Outstanding simulation performance far ahead of similar products widely used in the industry. Efficient utilization of multi-core processor architectures and modern graphics processors (GPU). Flexible scripting capabilities, built-in optimization tools, visualization and much more.

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